The Resource Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey
Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey
Resource Information
The item Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in Missouri University of Science & Technology Library.This item is available to borrow from 1 library branch.
Resource Information
The item Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in Missouri University of Science & Technology Library.
This item is available to borrow from 1 library branch.
- Summary
- The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new
- Language
- eng
- Extent
- 1 online resource.
- Contents
-
- Front Cover; Directed Self-assembly of Block Copolymers for Nano-manufacturing; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part One: Physics and chemistry of block copolymer (BCP) materials ; Chapter 1: Physics of block copolymers from bulk to thin films; 1.1 . Introduction; 1.2 . Order-disorder transition of block copolymers; 1.2.1 . Disordered state; 1.2.2 . Weak segregation limit in ordered state; 1.2.3 . Strong segregation limit in ordered state; 1.2.4 . Phase diagram obtained by using self-consistent field theory
- 1.3 . Morphologies of diblock copolymer/homopolymer mixtures1.4 . Dynamics of phase transition in block copolymers; 1.5 . Structures of block copolymer in thin films; 1.5.1 . Free energy of block copolymer thin film; 1.5.2 . Effect of surface energy term; F surface ; 1.5.3 . Effect of bulk energy term F bulk ; 1.6 . Conclusion; References; Chapter 2: RAFT synthesis of block copolymers and their self-assembly properties; 2.1 . RAFT process description; 2.2 . Polymerization process details; 2.2.1 . In situ process analysis; 2.3 . RAFT end-group catalytic radical reduction
- 2.4 . Block Copolymer In situ Topcoat Applications2.5 . DSA Applications; 2.6 . High chi block copolymers; 2.7 . Conclusions; Acknowledgments; References; Chapter 3: Thermal and solvent annealing of block copolymer films; 3.1 . Introduction; 3.2 . Thermal annealing of BCPs films; 3.2.1 . Fundamental consideration; 3.2.2 . Film thickness effect and temperature gradient; 3.2.3 . Crystallization behavior induced by thermal annealing; 3.3 . Solvent annealing of BCPs films; 3.3.1 . Fundamental consideration; 3.3.2 . Factors affecting the annealing process
- 3.3.3 . Combination of solvent annealing and thermal annealing3.4 . Summary and outlook; References; Chapter 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly; 4.1 Introduction; 4.2 Overview of field-theory-based simulations of block copolymer DSA; 4.3 Chemoepitaxy modeling; 4.4 Graphoepitaxy modeling; 4.4.1 Cylinders in a rectangular trench; 4.4.2 Contact hole shrink; 4.5 Summary and outlook; References; Part Two: Templates and patterning for directed self-assembly
- Chapter 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces5.1 . Introduction; 5.2 . Control of interfacial interactions; 5.3 . Graphoepitaxy; 5.3.1 . Fabrication of topographical surfaces; 5.3.2 . Geometry with deep patterning; 5.3.2.1 . Deep trench surfaces; 5.3.2.2 . Post surfaces; 5.3.2.3 . Other surfaces; 5.3.3 . Geometry with minimal patterning; 5.3.3.1 . Faceted surfaces; 5.3.3.2 . Shallow trench surfaces; 5.4 . Application of BCPs guided by topographical surfaces; 5.5 . Summary and outlook; References
- Isbn
- 9780081002612
- Label
- Directed self-assembly of block copolymers for nano-manufacturing
- Title
- Directed self-assembly of block copolymers for nano-manufacturing
- Statement of responsibility
- edited by Roel Gronheid and Paul Nealey
- Language
- eng
- Summary
- The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new
- Cataloging source
- N$T
- Dewey number
- 547/.84
- Index
- index present
- LC call number
- QD382.B5
- Literary form
- non fiction
- Nature of contents
-
- dictionaries
- bibliography
- http://library.link/vocab/relatedWorkOrContributorName
-
- Gronheid, Roel
- Nealey, Paul
- Series statement
- Woodhead Publishing series in electronic and optical materials
- Series volume
- number 83
- http://library.link/vocab/subjectName
-
- Block copolymers
- Self-assembly (Chemistry)
- Nanomanufacturing
- SCIENCE
- Block copolymers
- Nanomanufacturing
- Self-assembly (Chemistry)
- Label
- Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey
- Antecedent source
- unknown
- Bibliography note
- Includes bibliographical references and index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Color
- multicolored
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
-
- Front Cover; Directed Self-assembly of Block Copolymers for Nano-manufacturing; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part One: Physics and chemistry of block copolymer (BCP) materials ; Chapter 1: Physics of block copolymers from bulk to thin films; 1.1 . Introduction; 1.2 . Order-disorder transition of block copolymers; 1.2.1 . Disordered state; 1.2.2 . Weak segregation limit in ordered state; 1.2.3 . Strong segregation limit in ordered state; 1.2.4 . Phase diagram obtained by using self-consistent field theory
- 1.3 . Morphologies of diblock copolymer/homopolymer mixtures1.4 . Dynamics of phase transition in block copolymers; 1.5 . Structures of block copolymer in thin films; 1.5.1 . Free energy of block copolymer thin film; 1.5.2 . Effect of surface energy term; F surface ; 1.5.3 . Effect of bulk energy term F bulk ; 1.6 . Conclusion; References; Chapter 2: RAFT synthesis of block copolymers and their self-assembly properties; 2.1 . RAFT process description; 2.2 . Polymerization process details; 2.2.1 . In situ process analysis; 2.3 . RAFT end-group catalytic radical reduction
- 2.4 . Block Copolymer In situ Topcoat Applications2.5 . DSA Applications; 2.6 . High chi block copolymers; 2.7 . Conclusions; Acknowledgments; References; Chapter 3: Thermal and solvent annealing of block copolymer films; 3.1 . Introduction; 3.2 . Thermal annealing of BCPs films; 3.2.1 . Fundamental consideration; 3.2.2 . Film thickness effect and temperature gradient; 3.2.3 . Crystallization behavior induced by thermal annealing; 3.3 . Solvent annealing of BCPs films; 3.3.1 . Fundamental consideration; 3.3.2 . Factors affecting the annealing process
- 3.3.3 . Combination of solvent annealing and thermal annealing3.4 . Summary and outlook; References; Chapter 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly; 4.1 Introduction; 4.2 Overview of field-theory-based simulations of block copolymer DSA; 4.3 Chemoepitaxy modeling; 4.4 Graphoepitaxy modeling; 4.4.1 Cylinders in a rectangular trench; 4.4.2 Contact hole shrink; 4.5 Summary and outlook; References; Part Two: Templates and patterning for directed self-assembly
- Chapter 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces5.1 . Introduction; 5.2 . Control of interfacial interactions; 5.3 . Graphoepitaxy; 5.3.1 . Fabrication of topographical surfaces; 5.3.2 . Geometry with deep patterning; 5.3.2.1 . Deep trench surfaces; 5.3.2.2 . Post surfaces; 5.3.2.3 . Other surfaces; 5.3.3 . Geometry with minimal patterning; 5.3.3.1 . Faceted surfaces; 5.3.3.2 . Shallow trench surfaces; 5.4 . Application of BCPs guided by topographical surfaces; 5.5 . Summary and outlook; References
- Control code
- 914229807
- Dimensions
- unknown
- Extent
- 1 online resource.
- File format
- unknown
- Form of item
- online
- Isbn
- 9780081002612
- Level of compression
- unknown
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Quality assurance targets
- not applicable
- Reformatting quality
- unknown
- Sound
- unknown sound
- Specific material designation
- remote
- System control number
- (OCoLC)914229807
- Label
- Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey
- Antecedent source
- unknown
- Bibliography note
- Includes bibliographical references and index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Color
- multicolored
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
-
- Front Cover; Directed Self-assembly of Block Copolymers for Nano-manufacturing; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part One: Physics and chemistry of block copolymer (BCP) materials ; Chapter 1: Physics of block copolymers from bulk to thin films; 1.1 . Introduction; 1.2 . Order-disorder transition of block copolymers; 1.2.1 . Disordered state; 1.2.2 . Weak segregation limit in ordered state; 1.2.3 . Strong segregation limit in ordered state; 1.2.4 . Phase diagram obtained by using self-consistent field theory
- 1.3 . Morphologies of diblock copolymer/homopolymer mixtures1.4 . Dynamics of phase transition in block copolymers; 1.5 . Structures of block copolymer in thin films; 1.5.1 . Free energy of block copolymer thin film; 1.5.2 . Effect of surface energy term; F surface ; 1.5.3 . Effect of bulk energy term F bulk ; 1.6 . Conclusion; References; Chapter 2: RAFT synthesis of block copolymers and their self-assembly properties; 2.1 . RAFT process description; 2.2 . Polymerization process details; 2.2.1 . In situ process analysis; 2.3 . RAFT end-group catalytic radical reduction
- 2.4 . Block Copolymer In situ Topcoat Applications2.5 . DSA Applications; 2.6 . High chi block copolymers; 2.7 . Conclusions; Acknowledgments; References; Chapter 3: Thermal and solvent annealing of block copolymer films; 3.1 . Introduction; 3.2 . Thermal annealing of BCPs films; 3.2.1 . Fundamental consideration; 3.2.2 . Film thickness effect and temperature gradient; 3.2.3 . Crystallization behavior induced by thermal annealing; 3.3 . Solvent annealing of BCPs films; 3.3.1 . Fundamental consideration; 3.3.2 . Factors affecting the annealing process
- 3.3.3 . Combination of solvent annealing and thermal annealing3.4 . Summary and outlook; References; Chapter 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly; 4.1 Introduction; 4.2 Overview of field-theory-based simulations of block copolymer DSA; 4.3 Chemoepitaxy modeling; 4.4 Graphoepitaxy modeling; 4.4.1 Cylinders in a rectangular trench; 4.4.2 Contact hole shrink; 4.5 Summary and outlook; References; Part Two: Templates and patterning for directed self-assembly
- Chapter 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces5.1 . Introduction; 5.2 . Control of interfacial interactions; 5.3 . Graphoepitaxy; 5.3.1 . Fabrication of topographical surfaces; 5.3.2 . Geometry with deep patterning; 5.3.2.1 . Deep trench surfaces; 5.3.2.2 . Post surfaces; 5.3.2.3 . Other surfaces; 5.3.3 . Geometry with minimal patterning; 5.3.3.1 . Faceted surfaces; 5.3.3.2 . Shallow trench surfaces; 5.4 . Application of BCPs guided by topographical surfaces; 5.5 . Summary and outlook; References
- Control code
- 914229807
- Dimensions
- unknown
- Extent
- 1 online resource.
- File format
- unknown
- Form of item
- online
- Isbn
- 9780081002612
- Level of compression
- unknown
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Quality assurance targets
- not applicable
- Reformatting quality
- unknown
- Sound
- unknown sound
- Specific material designation
- remote
- System control number
- (OCoLC)914229807
Subject
- Self-assembly (Chemistry)
- Block copolymers
- Block copolymers
- Electronic books
- Electronic books
- Electronic bookss
- Nanomanufacturing
- Nanomanufacturing
- SCIENCE -- Chemistry | Organic
- Self-assembly (Chemistry)
Genre
Member of
- Woodhead Publishing series in electronic and optical materials, no. 83
- Ebook Central Academic Complete
Library Links
Embed
Settings
Select options that apply then copy and paste the RDF/HTML data fragment to include in your application
Embed this data in a secure (HTTPS) page:
Layout options:
Include data citation:
<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.library.mst.edu/portal/Directed-self-assembly-of-block-copolymers-for/c9NXY9Pcix8/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.library.mst.edu/portal/Directed-self-assembly-of-block-copolymers-for/c9NXY9Pcix8/">Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.library.mst.edu/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.library.mst.edu/">Missouri University of Science & Technology Library</a></span></span></span></span></div>
Note: Adjust the width and height settings defined in the RDF/HTML code fragment to best match your requirements
Preview
Cite Data - Experimental
Data Citation of the Item Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey
Copy and paste the following RDF/HTML data fragment to cite this resource
<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.library.mst.edu/portal/Directed-self-assembly-of-block-copolymers-for/c9NXY9Pcix8/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.library.mst.edu/portal/Directed-self-assembly-of-block-copolymers-for/c9NXY9Pcix8/">Directed self-assembly of block copolymers for nano-manufacturing, edited by Roel Gronheid and Paul Nealey</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.library.mst.edu/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.library.mst.edu/">Missouri University of Science & Technology Library</a></span></span></span></span></div>
