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The Resource Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines : Current and Future Trends, Munir Nayfeh

Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines : Current and Future Trends, Munir Nayfeh

Creator
Author
Summary
"Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines: Current and Future Trends addresses current and future trends in the application and commercialization of nanosilicon. The book presents current, innovative and prospective applications and products based on nanosilicon and their binary system in the fields of energy harvesting and storage, lighting (solar cells and nano-capacitor and fuel cell devices and nanoLEDs), electronics (nanotransistors and nanomemory, quantum computing, photodetectors for space applications; biomedicine (substance detection, plasmonic treatment of disease, skin and hair care, implantable glucose sensor, capsules for drug delivery and underground water and oil exploration), and art (glass and pottery). Moreover, the book includes material on the use of advanced laser and proximal probes for imaging and manipulation of nanoparticles and atoms. In addition, coverage is given to carbon and how it contrasts and integrates with silicon with additional related applications. This is a valuable resource to all those seeking to learn more about the commercialization of nanosilicon, and to researchers wanting to learn more about emerging nanosilicon applications. Features a variety of designs and operation of nano-devices, helping engineers to make the best use of nanosiliconContains underlying principles of how nanomaterials work and the variety of applications they provide, giving those new to nanosilicon a fundamental understandingAssesses the viability of various nanoslicon devices for mass production and commercialization, thereby providing an important source of information for engineers"--
Language
eng
Work
Publication
Extent
1 online resource
Contents
  • Cover; Title page; Copyright page; Contents; Preface; Chapter 1 -- Atom-by-Atom Manufacturing: The Birth of Nanotechnology; 1.1 -- Feynman's vision; 1.2 -- Feynman challenge funding; 1.3 -- Drawbacks of atom-by-atom (ABA); 1.4 -- Parallel manufacturing solution by K. Eric Drexler; References; Further Readings; Chapter 2 -- Seeing and Detecting Atoms in a Gas Using Light; 2.1 -- Picking stationary atoms with laser light; 2.2 -- Counting sodium atoms using resonance light (fluorescence) spectroscopy; 2.3 -- Detection of single atoms using light-induced electron resonance ionization
  • 2.3.1 -- Stopping/Cooling Atoms2.3.2 -- Atom-by-Atom Fabrication; References; Chapter 3 -- Trapping and Stopping/Cooling of Atoms, Particles, and Bio-components Using Laser Light; 3.1 -- Solar and laser sails; 3.2 -- Stopping atoms: atom trap (magneto-optical trap); 3.3 -- Trapping nano- to micro-particles (push-pull forces); 3.4 -- Trapping of ultrasmall nanoparticles: nano (trap) tweezers; 3.4.1 -- Higher NA; 3.4.2 -- Plasmonic (Metal) Nanolenses; 3.5 -- Thermal trapping of particles; References; Chapter 4 -- Seeing Atoms and Clusters onSurfaces
  • 4.1 -- Seeing nanoparticles and what's inside with free electrons4.1.1 Transmission Electron Microscope (TEM); 4.2 -- Seeing atoms, molecules, and nanoparticles on surfaces using tunneling electrons (STM Imaging); 4.2.1 -- Nanoparticles; 4.2.2 Spectroscopy Using Tunneling Scanning (STS): I-V Spectroscopy; 4.3 -- Mechanical atomic imaging (atomic force microscope -- AFM); 4.3.1 Imaging Nanoparticles; 4.4 -- Unveiling the surface topography: the oscillating cantilever; 4.5 -- Variety of tip-based imaging; 4.5.1 Conductive AFM (CAFM); 4.5.2 AFM Tip with Single Molecule Apex
  • 4.5.3 Magnetic Force Microscopy4.5.4 Near-Field Scanning Optical Microscopy (NSOM); 4.5.5 Scanning Electrochemical Microscopy (SECM) Ultra-Microelectrode (UME) Tip; 4.6 -- Tip preparation and effect of shape; 4.6.1 Metal Tips for STM; 4.6.2 Platinum-Iridium or Gold Tips; 4.6.3 Multiple Whisker Tips; 4.6.4 Solid Carbon Cone Tapping Mode; 4.6.5 Metal-Coated Silicon AFM Tips; 4.6.6 Carbon Nanotube Tips; References; Chapter 5 -- Manipulation and Patterning ofSurfaces (Nanolithography); 5.1 -- Standard visible and near UV photolithography; 5.2 -- Current photolithography (shorter wavelength)
  • 5.2.1 -- Wavelength-Independent Resolution5.2.2 -- Immersion Lithography; 5.2.2.1 -- Double Patterning: Increasing Feature Density; 5.3 -- New generation of lithography (NGL); 5.3.1 -- Extreme Ultraviolet Lithography (EUV-Lithography); 5.3.2 -- X-Ray Lithography; 5.3.3 -- Electron-Beam Lithography; 5.3.4 -- Focused Ion Beam (FIB) Lithography; 5.4 -- Variety of non-conventional lithography; 5.4.1 -- Nanoimprint (Mold) Lithography; 5.4.2 -- Plasmonic-Assisted Lithography; 5.4.2.1 -- Plasmonic Hyperlens-Based Lithography; 5.4.3 -- Laser Interference Lithography; 5.4.4 -- Nanosphere Shadow Lithography
  • 5.4.5 -- Resists
Isbn
9780323480581
Instance
Label
Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines : Current and Future Trends
Title
Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines
Title remainder
Current and Future Trends
Statement of responsibility
Munir Nayfeh
Creator
Author
Subject
Genre
Language
eng
Summary
"Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines: Current and Future Trends addresses current and future trends in the application and commercialization of nanosilicon. The book presents current, innovative and prospective applications and products based on nanosilicon and their binary system in the fields of energy harvesting and storage, lighting (solar cells and nano-capacitor and fuel cell devices and nanoLEDs), electronics (nanotransistors and nanomemory, quantum computing, photodetectors for space applications; biomedicine (substance detection, plasmonic treatment of disease, skin and hair care, implantable glucose sensor, capsules for drug delivery and underground water and oil exploration), and art (glass and pottery). Moreover, the book includes material on the use of advanced laser and proximal probes for imaging and manipulation of nanoparticles and atoms. In addition, coverage is given to carbon and how it contrasts and integrates with silicon with additional related applications. This is a valuable resource to all those seeking to learn more about the commercialization of nanosilicon, and to researchers wanting to learn more about emerging nanosilicon applications. Features a variety of designs and operation of nano-devices, helping engineers to make the best use of nanosiliconContains underlying principles of how nanomaterials work and the variety of applications they provide, giving those new to nanosilicon a fundamental understandingAssesses the viability of various nanoslicon devices for mass production and commercialization, thereby providing an important source of information for engineers"--
Member of
Assigning source
Provided by publisher
Cataloging source
N$T
http://library.link/vocab/creatorName
Nayfeh, Munir H.
Dewey number
620.115
Index
index present
LC call number
TA418.9.N35
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
Series statement
Micro and nano technologies
http://library.link/vocab/subjectName
  • Nanosilicon
  • Plasmonics
  • Fullerenes
  • TECHNOLOGY & ENGINEERING
  • TECHNOLOGY & ENGINEERING
  • Fullerenes
  • Nanosilicon
  • Plasmonics
Label
Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines : Current and Future Trends, Munir Nayfeh
Instantiates
Publication
Copyright
Antecedent source
unknown
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
  • Cover; Title page; Copyright page; Contents; Preface; Chapter 1 -- Atom-by-Atom Manufacturing: The Birth of Nanotechnology; 1.1 -- Feynman's vision; 1.2 -- Feynman challenge funding; 1.3 -- Drawbacks of atom-by-atom (ABA); 1.4 -- Parallel manufacturing solution by K. Eric Drexler; References; Further Readings; Chapter 2 -- Seeing and Detecting Atoms in a Gas Using Light; 2.1 -- Picking stationary atoms with laser light; 2.2 -- Counting sodium atoms using resonance light (fluorescence) spectroscopy; 2.3 -- Detection of single atoms using light-induced electron resonance ionization
  • 2.3.1 -- Stopping/Cooling Atoms2.3.2 -- Atom-by-Atom Fabrication; References; Chapter 3 -- Trapping and Stopping/Cooling of Atoms, Particles, and Bio-components Using Laser Light; 3.1 -- Solar and laser sails; 3.2 -- Stopping atoms: atom trap (magneto-optical trap); 3.3 -- Trapping nano- to micro-particles (push-pull forces); 3.4 -- Trapping of ultrasmall nanoparticles: nano (trap) tweezers; 3.4.1 -- Higher NA; 3.4.2 -- Plasmonic (Metal) Nanolenses; 3.5 -- Thermal trapping of particles; References; Chapter 4 -- Seeing Atoms and Clusters onSurfaces
  • 4.1 -- Seeing nanoparticles and what's inside with free electrons4.1.1 Transmission Electron Microscope (TEM); 4.2 -- Seeing atoms, molecules, and nanoparticles on surfaces using tunneling electrons (STM Imaging); 4.2.1 -- Nanoparticles; 4.2.2 Spectroscopy Using Tunneling Scanning (STS): I-V Spectroscopy; 4.3 -- Mechanical atomic imaging (atomic force microscope -- AFM); 4.3.1 Imaging Nanoparticles; 4.4 -- Unveiling the surface topography: the oscillating cantilever; 4.5 -- Variety of tip-based imaging; 4.5.1 Conductive AFM (CAFM); 4.5.2 AFM Tip with Single Molecule Apex
  • 4.5.3 Magnetic Force Microscopy4.5.4 Near-Field Scanning Optical Microscopy (NSOM); 4.5.5 Scanning Electrochemical Microscopy (SECM) Ultra-Microelectrode (UME) Tip; 4.6 -- Tip preparation and effect of shape; 4.6.1 Metal Tips for STM; 4.6.2 Platinum-Iridium or Gold Tips; 4.6.3 Multiple Whisker Tips; 4.6.4 Solid Carbon Cone Tapping Mode; 4.6.5 Metal-Coated Silicon AFM Tips; 4.6.6 Carbon Nanotube Tips; References; Chapter 5 -- Manipulation and Patterning ofSurfaces (Nanolithography); 5.1 -- Standard visible and near UV photolithography; 5.2 -- Current photolithography (shorter wavelength)
  • 5.2.1 -- Wavelength-Independent Resolution5.2.2 -- Immersion Lithography; 5.2.2.1 -- Double Patterning: Increasing Feature Density; 5.3 -- New generation of lithography (NGL); 5.3.1 -- Extreme Ultraviolet Lithography (EUV-Lithography); 5.3.2 -- X-Ray Lithography; 5.3.3 -- Electron-Beam Lithography; 5.3.4 -- Focused Ion Beam (FIB) Lithography; 5.4 -- Variety of non-conventional lithography; 5.4.1 -- Nanoimprint (Mold) Lithography; 5.4.2 -- Plasmonic-Assisted Lithography; 5.4.2.1 -- Plasmonic Hyperlens-Based Lithography; 5.4.3 -- Laser Interference Lithography; 5.4.4 -- Nanosphere Shadow Lithography
  • 5.4.5 -- Resists
Control code
1042158898
Dimensions
unknown
Extent
1 online resource
File format
unknown
Form of item
online
Isbn
9780323480581
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
http://library.link/vocab/ext/overdrive/overdriveId
9780323480581
Quality assurance targets
not applicable
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System control number
(OCoLC)1042158898
Label
Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines : Current and Future Trends, Munir Nayfeh
Publication
Copyright
Antecedent source
unknown
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
  • Cover; Title page; Copyright page; Contents; Preface; Chapter 1 -- Atom-by-Atom Manufacturing: The Birth of Nanotechnology; 1.1 -- Feynman's vision; 1.2 -- Feynman challenge funding; 1.3 -- Drawbacks of atom-by-atom (ABA); 1.4 -- Parallel manufacturing solution by K. Eric Drexler; References; Further Readings; Chapter 2 -- Seeing and Detecting Atoms in a Gas Using Light; 2.1 -- Picking stationary atoms with laser light; 2.2 -- Counting sodium atoms using resonance light (fluorescence) spectroscopy; 2.3 -- Detection of single atoms using light-induced electron resonance ionization
  • 2.3.1 -- Stopping/Cooling Atoms2.3.2 -- Atom-by-Atom Fabrication; References; Chapter 3 -- Trapping and Stopping/Cooling of Atoms, Particles, and Bio-components Using Laser Light; 3.1 -- Solar and laser sails; 3.2 -- Stopping atoms: atom trap (magneto-optical trap); 3.3 -- Trapping nano- to micro-particles (push-pull forces); 3.4 -- Trapping of ultrasmall nanoparticles: nano (trap) tweezers; 3.4.1 -- Higher NA; 3.4.2 -- Plasmonic (Metal) Nanolenses; 3.5 -- Thermal trapping of particles; References; Chapter 4 -- Seeing Atoms and Clusters onSurfaces
  • 4.1 -- Seeing nanoparticles and what's inside with free electrons4.1.1 Transmission Electron Microscope (TEM); 4.2 -- Seeing atoms, molecules, and nanoparticles on surfaces using tunneling electrons (STM Imaging); 4.2.1 -- Nanoparticles; 4.2.2 Spectroscopy Using Tunneling Scanning (STS): I-V Spectroscopy; 4.3 -- Mechanical atomic imaging (atomic force microscope -- AFM); 4.3.1 Imaging Nanoparticles; 4.4 -- Unveiling the surface topography: the oscillating cantilever; 4.5 -- Variety of tip-based imaging; 4.5.1 Conductive AFM (CAFM); 4.5.2 AFM Tip with Single Molecule Apex
  • 4.5.3 Magnetic Force Microscopy4.5.4 Near-Field Scanning Optical Microscopy (NSOM); 4.5.5 Scanning Electrochemical Microscopy (SECM) Ultra-Microelectrode (UME) Tip; 4.6 -- Tip preparation and effect of shape; 4.6.1 Metal Tips for STM; 4.6.2 Platinum-Iridium or Gold Tips; 4.6.3 Multiple Whisker Tips; 4.6.4 Solid Carbon Cone Tapping Mode; 4.6.5 Metal-Coated Silicon AFM Tips; 4.6.6 Carbon Nanotube Tips; References; Chapter 5 -- Manipulation and Patterning ofSurfaces (Nanolithography); 5.1 -- Standard visible and near UV photolithography; 5.2 -- Current photolithography (shorter wavelength)
  • 5.2.1 -- Wavelength-Independent Resolution5.2.2 -- Immersion Lithography; 5.2.2.1 -- Double Patterning: Increasing Feature Density; 5.3 -- New generation of lithography (NGL); 5.3.1 -- Extreme Ultraviolet Lithography (EUV-Lithography); 5.3.2 -- X-Ray Lithography; 5.3.3 -- Electron-Beam Lithography; 5.3.4 -- Focused Ion Beam (FIB) Lithography; 5.4 -- Variety of non-conventional lithography; 5.4.1 -- Nanoimprint (Mold) Lithography; 5.4.2 -- Plasmonic-Assisted Lithography; 5.4.2.1 -- Plasmonic Hyperlens-Based Lithography; 5.4.3 -- Laser Interference Lithography; 5.4.4 -- Nanosphere Shadow Lithography
  • 5.4.5 -- Resists
Control code
1042158898
Dimensions
unknown
Extent
1 online resource
File format
unknown
Form of item
online
Isbn
9780323480581
Level of compression
unknown
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
http://library.link/vocab/ext/overdrive/overdriveId
9780323480581
Quality assurance targets
not applicable
Reformatting quality
unknown
Sound
unknown sound
Specific material designation
remote
System control number
(OCoLC)1042158898

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