Directed self-assembly of block copolymers for nano-manufacturing
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The work Directed self-assembly of block copolymers for nano-manufacturing represents a distinct intellectual or artistic creation found in Missouri University of Science & Technology Library. This resource is a combination of several types including: Work, Language Material, Books.
The Resource
Directed self-assembly of block copolymers for nano-manufacturing
Resource Information
The work Directed self-assembly of block copolymers for nano-manufacturing represents a distinct intellectual or artistic creation found in Missouri University of Science & Technology Library. This resource is a combination of several types including: Work, Language Material, Books.
- Label
- Directed self-assembly of block copolymers for nano-manufacturing
- Statement of responsibility
- edited by Roel Gronheid and Paul Nealey
- Language
- eng
- Summary
- The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new
- Cataloging source
- N$T
- Dewey number
- 547/.84
- Index
- index present
- LC call number
- QD382.B5
- Literary form
- non fiction
- Nature of contents
-
- dictionaries
- bibliography
- Series statement
- Woodhead Publishing series in electronic and optical materials
- Series volume
- number 83
Context
Context of Directed self-assembly of block copolymers for nano-manufacturingWork of
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